能生产3nm！中国成功研发全新DUV光刻：完全不同于ASML
中国科学院成功研发出全新的全固态深紫外(DUV)激光器,可发射波长为193nm的相干光源,具有与ASML等公司现有技术完全不同的设计理念。该激光器采用自制的Yb:YAG晶体放大器生成1030nm的激光,通过两条不同的光学路径进行波长转换,最终生成193nm的激光光束。该技术有望应用于3nm工艺节点的半导体制造。然而,目前该激光器的输出功率仅为70mW,频率为6kHz,仍需进一步提升以满足商业化需求。
芯宇
国际光电工程学会
via Sky forever
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